International Conference on Solid State Devices and Materials

1975 Conference on Solid State Devices

Sep 1 - Sep 2, 1975The Tokyo Chamber of Commerce and Industry, Tokyo, Japan

International Conference on Solid State Devices and Materials

1975 Conference on Solid State Devices

Sep 1 - Sep 2, 1975The Tokyo Chamber of Commerce and Industry, Tokyo, Japan

[A-2-2]SEMI-INSULATING POLYCRYSTALLINE SILICON (SIPOS) FILMS APPLIED TO MOS INTEGRATED CIRCUITS

H. Yamoto, M. Okayama, T. Aoki, H. Mochizuki, M. Abe, T. Ando(1.SONY Corp. Semiconductor Product Div. and Semiconductor Development Div. Atsugi Plant)

https://doi.org/10.7567/SSDM.1975.A-2-2