1975 Conference on Solid State Devices

1975 Conference on Solid State Devices

Sep 1 - Sep 2, 1975The Tokyo Chamber of Commerce and Industry, Tokyo, Japan
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International Conference on Solid State Devices and Materials
1975 Conference on Solid State Devices

1975 Conference on Solid State Devices

Sep 1 - Sep 2, 1975The Tokyo Chamber of Commerce and Industry, Tokyo, Japan

[A-3-1]Low Temperature Annealing Characteristics of Phoshorus-Implanted Silicon

M. Miyao, N. Natsuaki, N. Yoshihiro, M. Tamura, T. Tokuyama(1.Central Research Laboratory, Hitachi Ltd.)
https://doi.org/10.7567/SSDM.1975.A-3-1
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