International Conference on Solid State Devices and Materials

1976 International Conference on Solid State Devices

Sep 1 - Sep 3, 1976The Tokyo Chamber of Commerce and Industry, Tokyo, Japan

International Conference on Solid State Devices and Materials

1976 International Conference on Solid State Devices

Sep 1 - Sep 3, 1976The Tokyo Chamber of Commerce and Industry, Tokyo, Japan

[A-1-2]A New Technique for Low Concentration Diffusion of Boron into Silicon

Ginjiro Kambara, Susumu Koike, Toshio Matsuda, Morio Inoue(1.Research Laboratory, Matsushita Electronics Corporation)

https://doi.org/10.7567/SSDM.1976.A-1-2