1978 Conference on Solid State Devices

1978 Conference on Solid State Devices

Aug 29 - Aug 30, 1978The Tokyo Chamber of Commerce and Industry, Tokyo, Japan
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International Conference on Solid State Devices and Materials
1978 Conference on Solid State Devices

1978 Conference on Solid State Devices

Aug 29 - Aug 30, 1978The Tokyo Chamber of Commerce and Industry, Tokyo, Japan

[C-2-3]High Rate Deposition of ZnO Film Using Improved DC Reactive Magnetron Sputtering Technique

Tomonobu Hata, Toshiharu Minamikawa, Etsuji Noda, Toshio Hada(1.Faculty of Technology, Kanazawa University)
https://doi.org/10.7567/SSDM.1978.C-2-3
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