1979 International Conference on Solid State Devices
Aug 27 - Aug 29, 1979The Tokyo Chamber of Commerce and Industry, Tokyo, Japan
1979 International Conference on Solid State Devices
Aug 27 - Aug 29, 1979The Tokyo Chamber of Commerce and Industry, Tokyo, Japan
[A-1-9]Deposition of Silicon Nitride Films by High Rate Reactive Sputtering
Y. Hoshi, M. Naoe, S. Yamanaka(1.Faculty of Engineering, 2.Tokyo Institute of Technology)
