1979 International Conference on Solid State Devices

1979 International Conference on Solid State Devices

Aug 27 - Aug 29, 1979The Tokyo Chamber of Commerce and Industry, Tokyo, Japan
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International Conference on Solid State Devices and Materials
1979 International Conference on Solid State Devices

1979 International Conference on Solid State Devices

Aug 27 - Aug 29, 1979The Tokyo Chamber of Commerce and Industry, Tokyo, Japan

[A-2-7]P-CHANNEL VERSUS N-CHANNEL IN MOS-ICs OF SUBMICRON CHANNEL LENGTHS

Luong Mo DANG, Hiroshi IWAI, Yoshio NISHI, Shinji TAGUCHI(1.Toshiba R & D Center, 2.Toshiba Corporation c/o Horikawacho Works)
https://doi.org/10.7567/SSDM.1979.A-2-7
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