1979 International Conference on Solid State Devices

1979 International Conference on Solid State Devices

Aug 27 - Aug 29, 1979The Tokyo Chamber of Commerce and Industry, Tokyo, Japan
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International Conference on Solid State Devices and Materials
1979 International Conference on Solid State Devices

1979 International Conference on Solid State Devices

Aug 27 - Aug 29, 1979The Tokyo Chamber of Commerce and Industry, Tokyo, Japan

[A-3-4]Resistivity Reduction of Polycrystalline Silicon Films by Laser Annealing

Susumu KOHYAMA, Shinji ONGA, Kenji SHIBATA, Hisakazu IIZUKA(1.Semiconductor Device Engineering Lab. Toshiba Corporation)
https://doi.org/10.7567/SSDM.1979.A-3-4
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