1983 Conference on Solid State Devices and Materials
Aug 30 - Sep 1, 1983The Tokyo Chamber of Commerce and Industry, Tokyo, Japan
1983 Conference on Solid State Devices and Materials
Aug 30 - Sep 1, 1983The Tokyo Chamber of Commerce and Industry, Tokyo, Japan
[A-1-2]Study on Formation of Solid-Phase-Epitaxial CoSi2, Films and Patterning Effects
Kouichirou Ishibashi, Hiroshi Ishiwara, Seijiro Furukawa(1.Graduate School of Science and Engineering, Tokyo Institute of Technology)
