1983 Conference on Solid State Devices and Materials

1983 Conference on Solid State Devices and Materials

Aug 30 - Sep 1, 1983The Tokyo Chamber of Commerce and Industry, Tokyo, Japan
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International Conference on Solid State Devices and Materials
1983 Conference on Solid State Devices and Materials

1983 Conference on Solid State Devices and Materials

Aug 30 - Sep 1, 1983The Tokyo Chamber of Commerce and Industry, Tokyo, Japan

[A-1-3]Ultra-Smooth Heteroepitaxial NiSi2, Films on Silicon Grown by Molecular Beam Epitaxy

A. Ishizaka, Y. Shiraki, K. Nakagawa, E. Maruyama(1.Central Research Laboratory, Hitachi, Ltd.)
https://doi.org/10.7567/SSDM.1983.A-1-3
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