1983 Conference on Solid State Devices and Materials
Aug 30 - Sep 1, 1983The Tokyo Chamber of Commerce and Industry, Tokyo, Japan
[A-2-3]Formation of Si Epi./MgO・Al2O3 Epi./SiO2/Si and Its Epitaxial Film Quality
Masao Mikami, Yasuaki Hokari, Koji Egami, Hideki Tsuya, Masaru Kanamori(1.Fundamental Research Laboratories and Microelectronics Laboratories, NEC Corporation)