1983 Conference on Solid State Devices and Materials

1983 Conference on Solid State Devices and Materials

Aug 30 - Sep 1, 1983The Tokyo Chamber of Commerce and Industry, Tokyo, Japan
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International Conference on Solid State Devices and Materials
1983 Conference on Solid State Devices and Materials

1983 Conference on Solid State Devices and Materials

Aug 30 - Sep 1, 1983The Tokyo Chamber of Commerce and Industry, Tokyo, Japan

[A-4-2]Photo-CVD Silicon Nitride and Silicon Oxide Films for VLSI Application

M. Hatanaka, H. Ito, H. Abe, H. Nakata(1.LSI R&D Laboratory, Mitsubishi Electric Corporation)
https://doi.org/10.7567/SSDM.1983.A-4-2
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