1984 International Conference on Solid State Devices and Materials

1984 International Conference on Solid State Devices and Materials

Aug 30 - Sep 1, 1984International Conference Center Kobe, Kobe, Japan
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International Conference on Solid State Devices and Materials
1984 International Conference on Solid State Devices and Materials

1984 International Conference on Solid State Devices and Materials

Aug 30 - Sep 1, 1984International Conference Center Kobe, Kobe, Japan

[A-2-2]Nanometer E-Beam Lithography Using 2-Layer Resist System Composed of Silicone-Based Negative Resist (SNR)

Akio Sugita, Masao Morita, Toshiaki Tamamura(1.Ibaraki Electrical Communication Laboratory, NTT)
https://doi.org/10.7567/SSDM.1984.A-2-2
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