1984 International Conference on Solid State Devices and Materials

1984 International Conference on Solid State Devices and Materials

Aug 30 - Sep 1, 1984International Conference Center Kobe, Kobe, Japan
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International Conference on Solid State Devices and Materials
1984 International Conference on Solid State Devices and Materials

1984 International Conference on Solid State Devices and Materials

Aug 30 - Sep 1, 1984International Conference Center Kobe, Kobe, Japan

[B-3-5]Enhanced Impurity Redistribution for Silicided Source/Drain

Masakazu KAKUMU, Kazuhiko HASHIMOTO, Yoshio NISHI(1.Semiconductor Device Engineering Laboratory TOSHIBA Corporation)
https://doi.org/10.7567/SSDM.1984.B-3-5
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