[C-3-3]Formation of Buried Isolation Layer by Implanting Focused B Ion Beam in GaAs Multilayer Using FIBI-MBE System
Hiroshi Arimoto, Tetsuo Morita, Akira Takamori, Yasuo Bamba, Eizo Miyauchi, Hisao Hashimoto(1.Optoelectronics Joint Research Laboratory)
