1987 Conference on Solid State Devices and Materials

1987 Conference on Solid State Devices and Materials

Aug 25 - Aug 27, 1987Nippon Toshi Center, Tokyo, Japan
International Conference on Solid State Devices and Materials
1987 Conference on Solid State Devices and Materials

1987 Conference on Solid State Devices and Materials

Aug 25 - Aug 27, 1987Nippon Toshi Center, Tokyo, Japan

[C-3-1]The Effect of Charge Build-up on Gate Oxide Breakdown during Dry Etching

Kazuyuki TSUNOKUNI, Kazuo NOJIRI, Sumi KUBOSHIMA, Kado HIROBE(1.Musashi Works, Hitachi, Ltd., 2.Hitachi Microcomputer Engneering, Ltd., 3.Kanagawa Works , Hitachi, Ltd.)
https://doi.org/10.7567/SSDM.1987.C-3-1