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1987 Conference on Solid State Devices and Materials
Aug 25
- Aug 27, 1987
Nippon Toshi Center, Tokyo, Japan
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1987 Conference on Solid State Devices and Materials
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1987 Conference on Solid State Devices and Materials
Aug 25
- Aug 27, 1987
Nippon Toshi Center, Tokyo, Japan
[C-3-1]
The Effect of Charge Build-up on Gate Oxide Breakdown during Dry Etching
Kazuyuki TSUNOKUNI, Kazuo NOJIRI, Sumi KUBOSHIMA, Kado HIROBE(1.Musashi Works, Hitachi, Ltd., 2.Hitachi Microcomputer Engneering, Ltd., 3.Kanagawa Works , Hitachi, Ltd.)
https://doi.org/10.7567/SSDM.1987.C-3-1
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