[C-3-2]Electron Spin Resonance Study of a New Positively Charged Defect in Device Oxides Damaged by Soft X-Rays
B. B. Triplett, T. Takahashi, K. Yokogawa, T. Sugano(1.Dept. of Electronic Engineering, University of Tokyo, 2.Intel Researcher in Residence, 3.Nippon Steel Corporation)
