1988 International Conference on Solid State Devices and Materials
Aug 24 - Aug 26, 1988Keio Plaza Hotel, Tokyo, Japan
[A-3-3]Low Temperature CVD Technique for Crystalline Si Deposition
T. Fujii, H. Araki, M. Ohkuni, Y. Tarui(1.Department of Electronic Engineering, Tokyo University of Agriculture & Technology, 2.VLSI Development Laboratories, Sharp Corporation)