1989 Conference on Solid State Devices and Materials
Aug 28 - Aug 30, 1989Nippon Toshi Center, Tokyo, Japan
1989 Conference on Solid State Devices and Materials
Aug 28 - Aug 30, 1989Nippon Toshi Center, Tokyo, Japan
[A-1-1]Thermally Stable TiSi2 Thin Films by Modification in Interface and Surface Structures
A. Ohsaki, J. Komori, T. Katayama, M. Shimizu, T. Okamoto, H. Kotani, S. Nagao(1.LSI Research and Development Laboratory Mitsubishi Electric Corporation)
