1989 Conference on Solid State Devices and Materials
Aug 28 - Aug 30, 1989Nippon Toshi Center, Tokyo, Japan
1989 Conference on Solid State Devices and Materials
Aug 28 - Aug 30, 1989Nippon Toshi Center, Tokyo, Japan
[A-1-3]Reduction of Internal Stress by Compositional Gradient Layer Inserted between TiSi2 and Si
Tomonobu HATA, Masanobu Tsuchitani, Kenji Kamiya, Susumu Horita(1.Faculty of Technology, Kanazawa University)
