International Conference on Solid State Devices and Materials
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1989 Conference on Solid State Devices and Materials
Aug 28
- Aug 30, 1989
Nippon Toshi Center, Tokyo, Japan
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1989 Conference on Solid State Devices and Materials
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1989 Conference on Solid State Devices and Materials
Aug 28
- Aug 30, 1989
Nippon Toshi Center, Tokyo, Japan
[A-5-1]
High Voltage MOSFETs Using Submicron LSI Process
Masatoshi Morikawa, Isao Yoshida, Hirotsugu Kojima, Yoshifumi Kawamoto(1.Central Research Laboratory, Hitachi Ltd.)
https://doi.org/10.7567/SSDM.1989.A-5-1
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