1989 Conference on Solid State Devices and Materials
Aug 28 - Aug 30, 1989Nippon Toshi Center, Tokyo, Japan
1989 Conference on Solid State Devices and Materials
Aug 28 - Aug 30, 1989Nippon Toshi Center, Tokyo, Japan
[A-5-2]A New Dielectric Isolation Technology Using Molten Silicon Spin Deposition
S. Itoh, S. Tanabe, T. Usui, K. Akahane, E. Fujya, Y. Tahara, Y. Maeda(1.Electronic Devices Group, Oki Electric Industry Co., Ltd., 2.Hoxan Research Laboratories, Hoxan Corporation)
