1989 Conference on Solid State Devices and Materials

1989 Conference on Solid State Devices and Materials

Aug 28 - Aug 30, 1989Nippon Toshi Center, Tokyo, Japan
Back
International Conference on Solid State Devices and Materials
1989 Conference on Solid State Devices and Materials

1989 Conference on Solid State Devices and Materials

Aug 28 - Aug 30, 1989Nippon Toshi Center, Tokyo, Japan

[B-1-3]Effect of Temperature on Dry Etching of Copper Films in Chlorinated Gases

Kazuhide Ohno, Masaaki Sato, Yoshinobu Arita(1.NTT LSI Laboratories)
https://doi.org/10.7567/SSDM.1989.B-1-3
Download PDFDownload PDF
Back