[A-3-1]In-Situ Observation of Electromigration in Cu Film with Scanning μ-RHEED Microscope
Kazuya Masu, Yohei Hiura, Kazuo Tsubouchi, Tadahiro Ohmi, Nobuo Mikoshiba(1.Research Institute of Electrical Communication, Tohoku University, 2.Department of Electronics, Faculty of Engineering, Tohoku University)
