[A-1-4]Lateral Solid Phase Epitaxy of Amorphous Si Films under Ultrahigh Pressure
H. Ishiwara, H. Wakabayashi, K. Miyazaki, K. Fukao, A. Sawaoka(1.Precision and Intelligence Laboratory, Tokyo Institute of Technology, 2.Canon Inc., R/D, 3.Kanagawa works Hitachi Ltd., 4.Engineering Materials Laboratory, Tokyo Institute of Technology)
