1992 International Conference on Solid State Devices and Materials
Aug 26 - Aug 28, 1992Tsukuba Center Building, Tsukuba, Japan
1992 International Conference on Solid State Devices and Materials
Aug 26 - Aug 28, 1992Tsukuba Center Building, Tsukuba, Japan
[PA1-3]In-situ Characterization of Si Surface Oxidation by High-Sensitivity Infrared Reflection Spectroscopic Method in Vacuum Chamber
M. NISHIDA, Y. MATSUI, M. OKUYAMA, Y. HAMAKAWA(1.Department of Electrical Engineering, Faculty of Engineering Science, Osaka University)
