1992 International Conference on Solid State Devices and Materials
Aug 26 - Aug 28, 1992Tsukuba Center Building, Tsukuba, Japan
1992 International Conference on Solid State Devices and Materials
Aug 26 - Aug 28, 1992Tsukuba Center Building, Tsukuba, Japan
[PA1-4]Nanometer Resolution Measurement of Dielectric Breakdown of Silicon Dioxide Films with AFM/STM
Yoshinobu FUKANO, Yasuhiro SUGAWARA, Seizo MORITA, Yoshiki YAMANISHI, Takahiko OASA(1.Department of Physics, Faculty of Science, Hiroshima University, 2.Advanced Technology Research Labs., Sumitomo Metal Industries, Ltd.)
