1994 International Conference on Solid State Devices and Materials
Aug 23 - Aug 26, 1994Pacifico Yokohama, Yokohama, Japan
1994 International Conference on Solid State Devices and Materials
Aug 23 - Aug 26, 1994Pacifico Yokohama, Yokohama, Japan
[S-I-3-4]Evaluation of Thin SiO2 Layers by Beam Assisted Scanning Tunneling Microscope
Seiji Heike, Yasuo Wada, Seiichi Kondo, Mark Lutwyche, Ken Murayama, Hiroshi Kuroda(1.Advanced Research Laboratory, Hitachi, Ltd., 2.Technical Research Laboratory, Research and Development Division, Hitachi Construction Machinery Co., Ltd.)
