[S-I-8-1]Electron-Beam Induced Etching as a Key Process in Through-Vacuum Fabrication of GaAs-AlGaAs Nanoheterostructures
Yoshifumi KATAYAMA, Tomonori ISHIKAWA, Nobuyuki TANAKA, Maximo LOPEZ, Isamu MATSUYAMA, Yuichi IDE, Masamichi YAMADA(1.Opotelectronics Technology Research Laboratory (OTL))
