1994 International Conference on Solid State Devices and Materials

1994 International Conference on Solid State Devices and Materials

Aug 23 - Aug 26, 1994Pacifico Yokohama, Yokohama, Japan
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International Conference on Solid State Devices and Materials
1994 International Conference on Solid State Devices and Materials

1994 International Conference on Solid State Devices and Materials

Aug 23 - Aug 26, 1994Pacifico Yokohama, Yokohama, Japan

[S-I-8-2]EB Patterning Mechanism of GaAs Oxide Mask Layers Used in In-Situ EB Lithography

N. Tanaka, M. Lopez, I. Matsuyama, T. Ishikawa(1.Optoelectronics Technology Research Laboratory (OTL))
https://doi.org/10.7567/SSDM.1994.S-I-8-2
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