1995 International Conference on Solid State Devices and Materials

1995 International Conference on Solid State Devices and Materials

Aug 21 - Aug 24, 1995International House, Osaka, Japan
Back
International Conference on Solid State Devices and Materials
1995 International Conference on Solid State Devices and Materials

1995 International Conference on Solid State Devices and Materials

Aug 21 - Aug 24, 1995International House, Osaka, Japan

[S-I-4-3]Investigation of Interlayer Dielectric Material Influence on DRAM Retention Time

M. Ohishi, K. Matsui, K. Koyama(1.ULSI Device Development Laboratories, NEC Corporation)
https://doi.org/10.7567/SSDM.1995.S-I-4-3
Download PDFDownload PDF
Back