1995 International Conference on Solid State Devices and Materials
Aug 21 - Aug 24, 1995International House, Osaka, Japan
1995 International Conference on Solid State Devices and Materials
Aug 21 - Aug 24, 1995International House, Osaka, Japan
[S-IV-4]W as a BIT Line Interconnection in COB Structured DRAM and Feasible Diffusion Barrier Layer
Jeong Soo Byun, Jun Ki Kim, Jin Won Park, Jae Jeong Kim(1.ULSI Laboratory of LG Semicon Co. Ltd.)
