1996 International Conference on Solid State Devices and Materials
Aug 26 - Aug 29, 1996Pacifico Yokohama, Yokohama, Japan
1996 International Conference on Solid State Devices and Materials
Aug 26 - Aug 29, 1996Pacifico Yokohama, Yokohama, Japan
[A-5-2]Anomalous Junction Leakage Behavior of Ti-SALICIDE Contacts on Ultra-Shallow Junctions
Atsuko SAKATA, Masato KOYAMA, Haruko AKUTSU, Iwao KUNISHIMA, Mitsuo KOIKE, Mitsuhiro TOMITA(1.Microelectronics Engineering Laboratory, ULSI Research Laboratories, Environmental Engineering Laboratory, TOSHIBA Corporation)
