1996 International Conference on Solid State Devices and Materials
Aug 26 - Aug 29, 1996Pacifico Yokohama, Yokohama, Japan
1996 International Conference on Solid State Devices and Materials
Aug 26 - Aug 29, 1996Pacifico Yokohama, Yokohama, Japan
[B-1-3]RIE-Lag Reduction by NH3 Addition in Aluminum Alloy Etching under BCl3/Cl2 Chemistry
Michinari YAMANAKA, Hideo NAKAGAWA, Masafumi KUBOTA(1.Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd.)
