1996 International Conference on Solid State Devices and Materials
Aug 26 - Aug 29, 1996Pacifico Yokohama, Yokohama, Japan
1996 International Conference on Solid State Devices and Materials
Aug 26 - Aug 29, 1996Pacifico Yokohama, Yokohama, Japan
[B-1-4]Double Spacer LOCOS Process with Shallow Recess of Silicon for 0.20 μm Isolation
Byung-Jin Cho, Se-Aug Jang, Tae-Sik Song, Seung-Ho Pyi, Jong-Choul Kim(1.Memory R&D Div., HYUNDAI Electronics Ind. Co. Ltd.)
