1997 International Conference on Solid State Devices and Materials
Sep 16 - Sep 19, 1997ACT CITY Hamamatsu, Hamamatsu, Japan
1997 International Conference on Solid State Devices and Materials
Sep 16 - Sep 19, 1997ACT CITY Hamamatsu, Hamamatsu, Japan
[A-2-2]Highly Reliable Interpoly Oxide Using ECR N2O-Plasma for Next Generation Flash Memory
Nae-In Lee, Jin-Woo Lee, Sung-Hoi Hur, Hyoung-Sub Kim, Chul-Hi Han(1.Department of Electrical Engineering, KAIST, 2.Semiconductor R & D Center, Samsung Electronics Co. Ltd.)
