International Conference on Solid State Devices and Materials
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1999 International Conference on Solid State Devices and Materials
Sep 21
- Sep 24, 1999
Nihon Toshi Center Kaikan, Tokyo, Japan
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1999 International Conference on Solid State Devices and Materials
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1999 International Conference on Solid State Devices and Materials
Sep 21
- Sep 24, 1999
Nihon Toshi Center Kaikan, Tokyo, Japan
[A-1-2]
Leakage Mechanism of Local Junctions Forming Main or Tail Mode of DRAM Retention Characteristics
Shuichi Ueno, Yasuo Inoue, Masahide Inuishi(1.ULSI development center, MITSUBISHI electric corporation)
https://doi.org/10.7567/SSDM.1999.A-1-2
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