1999 International Conference on Solid State Devices and Materials

1999 International Conference on Solid State Devices and Materials

Sep 21 - Sep 24, 1999Nihon Toshi Center Kaikan, Tokyo, Japan
International Conference on Solid State Devices and Materials
1999 International Conference on Solid State Devices and Materials

1999 International Conference on Solid State Devices and Materials

Sep 21 - Sep 24, 1999Nihon Toshi Center Kaikan, Tokyo, Japan

[A-1-2]Leakage Mechanism of Local Junctions Forming Main or Tail Mode of DRAM Retention Characteristics

Shuichi Ueno, Yasuo Inoue, Masahide Inuishi(1.ULSI development center, MITSUBISHI electric corporation)
https://doi.org/10.7567/SSDM.1999.A-1-2