International Conference on Solid State Devices and Materials
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1999 International Conference on Solid State Devices and Materials
Sep 21
- Sep 24, 1999
Nihon Toshi Center Kaikan, Tokyo, Japan
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1999 International Conference on Solid State Devices and Materials
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1999 International Conference on Solid State Devices and Materials
Sep 21
- Sep 24, 1999
Nihon Toshi Center Kaikan, Tokyo, Japan
[A-1-5]
Stress Induced Subthreshold Current Hump in Short Gate-Length pMOSFET's with Shallow Trench Isolation
L. P. Chiang, L. Y. Huang, N. K. Zous, Tahui Wang(1.Department of Electronics Engineering, National Chiao-Tung University)
https://doi.org/10.7567/SSDM.1999.A-1-5
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