1999 International Conference on Solid State Devices and Materials
Sep 21 - Sep 24, 1999Nihon Toshi Center Kaikan, Tokyo, Japan
1999 International Conference on Solid State Devices and Materials
Sep 21 - Sep 24, 1999Nihon Toshi Center Kaikan, Tokyo, Japan
[A-1-6]Optimized Shallow Trench Isolation Technology for DRAM Embedded Logic Process
T. Yamazaki, K. Ohno, N. Tsuchiya, T. Gocho(1.Process Development Department, LSI R&D Group, Core Technology & Network Company, Sony Corp.)
