1999 International Conference on Solid State Devices and Materials
Sep 21 - Sep 24, 1999Nihon Toshi Center Kaikan, Tokyo, Japan
1999 International Conference on Solid State Devices and Materials
Sep 21 - Sep 24, 1999Nihon Toshi Center Kaikan, Tokyo, Japan
[B-1-3]Anomalous Hot Carrier Degradation of nMOSFETs with an Ultra-Shallow Source/Drain Extension
Kaori Nakamura, Eiichi Murakami, Shin'ichiro Kimura(1.ULSI Research Department, Central Research Laboratory, Hitachi Ltd.)
