2000 International Conference on Solid State Devices and Materials
Aug 29 - Aug 31, 2000Sendai International Center, Sendai, Japan
2000 International Conference on Solid State Devices and Materials
Aug 29 - Aug 31, 2000Sendai International Center, Sendai, Japan
[A-1-4]A Study on Mechanism of Chemical Mechanical Polishing on Al and Cu Surfaces Employing In-situ Infrared Spectroscopy
Hiroki Ogawa, Yusuke Tokuyama, Michihiko Yanagisawa, Jun Kikuchi, Yasuhiro Horiike(1.Department of Materials Science, School of Engineering, University of Tokyo, 2.Speedfam-IPEC Co., Ltd., 3.Axiomatec Inc.)
