2000 International Conference on Solid State Devices and Materials
Aug 29 - Aug 31, 2000Sendai International Center, Sendai, Japan
2000 International Conference on Solid State Devices and Materials
Aug 29 - Aug 31, 2000Sendai International Center, Sendai, Japan
[A-1-6]Aluminum Chemical Vapor Deposition Technology for High Deposition Rate and Surface Morphology Improvement
Chang-Hun Lee, Takamasa Nishimura, Kazuya Masu, Kazuo Tsubouchi(1.Research Institute of Electrical Communication, Tohoku University)
