2000 International Conference on Solid State Devices and Materials
Aug 29 - Aug 31, 2000Sendai International Center, Sendai, Japan
2000 International Conference on Solid State Devices and Materials
Aug 29 - Aug 31, 2000Sendai International Center, Sendai, Japan
[A-1-7]Novel Nozzle-Scan Coating Method for Low-k Films
R. Nakata, N. Yamada, A. Kajita, S. Ito, K. Okumura, T. Kitano, M. Morikawa, K. Takeshita, Y. Esaki, M. Akimoto(1.PROCESS & MANUFACTURING ENGINEERING CENTER, TOSHIBA CORPORATION, 2.SYSTEM LSI DEVELOPMENT CENTER, TOSHIBA CORPORATION, 3.R&D Dept., Tokyo Electron Kyushu Ltd.)
