2000 International Conference on Solid State Devices and Materials
Aug 29 - Aug 31, 2000Sendai International Center, Sendai, Japan
2000 International Conference on Solid State Devices and Materials
Aug 29 - Aug 31, 2000Sendai International Center, Sendai, Japan
[B-1-8]A Novel T-Shaped Shallow Trench Isolation Technology Using Sidewall Spacer for 512Mbit Flash Memories and Beyond
S. H. Hong, D. H. Ahn, M. H. Park, T. K. Kim, H. K. Kang, J. T. Moon(1.Semiconductor R&D Center, Samsung Electronics Co., LTD)
