International Conference on Solid State Devices and Materials
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2000 International Conference on Solid State Devices and Materials
Aug 29
- Aug 31, 2000
Sendai International Center, Sendai, Japan
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2000 International Conference on Solid State Devices and Materials
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2000 International Conference on Solid State Devices and Materials
Aug 29
- Aug 31, 2000
Sendai International Center, Sendai, Japan
[B-2-4]
Impact of Strained-Si Channel on CMOS Circuit Performance under the Sub-100nm Regime
Tetsuo Hatakeyama, Kazuya Matsuzawa, Shin-ichi Takagi(1.Advanced LSI Technology Laboratory, Corporate Research & Development Center, Toshiba Corporation)
https://doi.org/10.7567/SSDM.2000.B-2-4
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