2001 International Conference on Solid State Devices and Materials
Sep 26 - Sep 28, 2001Diamond Hotel, Tokyo, Japan
2001 International Conference on Solid State Devices and Materials
Sep 26 - Sep 28, 2001Diamond Hotel, Tokyo, Japan
[A-1-5]CMP Using Fixed Abrasive Tool (FX-CMP) for Dielectric Planarization
S. Katagiri, K. Yasui, Y. Kawamura, U. Yamaguchi, M. Nagasawa, F. Kanai, R. Kawai, M. Tokuda, S. Moriyama, N. Yamada(1.Central Research Laboratory, Hitachi, Ltd., 2.Semiconductor & Integrated circuits, Hitachi, Ltd., 3.Manufacturing Engineering & Environmental Policy Department, Hitachi, Ltd., 4.Instruments, Hitachi, Ltd., 5.Institute of Technologists, 6.Nihon Tokushu Kento co., Ltd.)
