2002 International Conference on Solid State Devices and Materials
Sep 17 - Sep 19, 2002Nagoya Congress Center, Nagoya, Japan
2002 International Conference on Solid State Devices and Materials
Sep 17 - Sep 19, 2002Nagoya Congress Center, Nagoya, Japan
[A-2-2]Modeling and Analysis of Gate Line Edge Roughness Effect on CMOS Scaling Towards Deep Nanoscale Gate Length
Seong-Dong Kim, Sungkwon Hong, Jae-Kwan Park, Jason C. S. Woo(1.Department of Electrical Engineering, University of California)
