2002 International Conference on Solid State Devices and Materials
Sep 17 - Sep 19, 2002Nagoya Congress Center, Nagoya, Japan
2002 International Conference on Solid State Devices and Materials
Sep 17 - Sep 19, 2002Nagoya Congress Center, Nagoya, Japan
[B-1-3]Study on Densification and Oxidation Mechanism during PDA for Minimum EOT of Ultrathin CVD HfO2
Yoshinao Harada, Masaaki Niwa, Dim-Lee Kwong(1.ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd., 2.Micro Electronics Research Center, The University of Texas at Austin)
