2002 International Conference on Solid State Devices and Materials
Sep 17 - Sep 19, 2002Nagoya Congress Center, Nagoya, Japan
2002 International Conference on Solid State Devices and Materials
Sep 17 - Sep 19, 2002Nagoya Congress Center, Nagoya, Japan
[C-1-4]Characterization of Si Surface Stress in Various Dielectric Thin Film/Si Structure by Photoreflectance Spectroscopy
Masayuki Sohgawa, Hirofumi Kanda, Takeshi Kanashima, Akira Fujimoto, Masanori Okuyama(1.Area of Materials and Device Physics, Department of Physical Science, Graduate School of Engineering Science, Osaka University, 2.Dept. Electrical Engineering, Wakayama National College of Technology)
