2002 International Conference on Solid State Devices and Materials
Sep 17 - Sep 19, 2002Nagoya Congress Center, Nagoya, Japan
2002 International Conference on Solid State Devices and Materials
Sep 17 - Sep 19, 2002Nagoya Congress Center, Nagoya, Japan
[C-2-4]Comparison Studies on Oxygen Diffusion Coefficients for ALD-Al2O3 and PLD-HfO2 Films using 18O Isotope
Toshihide Nabatame, Tetsuji Yasuda, Masayasu Nishizawa, Minoru Ikeda, Tsuyoshi Horikawa, Akira Toriumi(1.MIRAI Project, Association of Super-Advanced Electronics Technologies (ASET), 2.MIRAI Project, Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST), 3.Department of Materials Science School of Engineering, University of Tokyo)
