2004 International Conference on Solid State Devices and Materials
Sep 14 - Sep 17, 2004Tower Hall Funabori, Tokyo, Japan
2004 International Conference on Solid State Devices and Materials
Sep 14 - Sep 17, 2004Tower Hall Funabori, Tokyo, Japan
[A-2-1]Fully Silicided NiSi Gates on HfSiON Gate Dielectrics for Low Power Application
Kenzo Manabe, Kensuke Takahashi, Taeko Ikarashi, Ayuka Morioka, Heiji Watanabe, Takuya Yoshihara, Toru Tatsumi(1.System Devices Research Laboratories, NEC Corporation)
